Dynamic-moving-window scheme for virtual-metrology model refreshing

Wei Ming Wu, Fan Tien Cheng, Fan Wei Kong

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

Virtual metrology (VM) is a method to conjecture manufacturing quality of a process tool based on data sensed from the process tool without physical metrology operations. Historical data is used to produce the initial VM models, and then these models are applied to operating in a process drift or shift environment. The accuracy of VM highly depends on the modeling samples adopted during initial-creating and online-refreshing periods. Since large resources are required, design-of-experiments may not be performed. In that case, how could we guarantee the stability of the models and predictions as they move into the unknown environment? Conventionally, static-moving-window (SMW) schemes with a fixed window size are adopted in the online-refreshing period. The purpose of this paper is to propose a dynamic-moving-window (DMW) scheme for VM model refreshing to enhance prediction accuracy. The DMW scheme adds a new sample into the model and applies a clustering technology to do similarity clustering. Next, the number of elements in each cluster is checked. If the largest number of the elements is greater than the predefined threshold, then the oldest sample in the cluster with the largest population is deleted. Both the adaptive-resonance-theory-2 and the newly proposed weighted-Euclidean-distance methods are applied to do similarity clustering.

Original languageEnglish
Article number6126059
Pages (from-to)238-246
Number of pages9
JournalIEEE Transactions on Semiconductor Manufacturing
Volume25
Issue number2
DOIs
Publication statusPublished - 2012 May 11

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Dynamic-moving-window scheme for virtual-metrology model refreshing'. Together they form a unique fingerprint.

  • Cite this