Early failure induced by phase transformation in microjoints for chip-level integration

Ren Shin Cheng, Hung Jen Chang, Tao Chih Chang, Jung-Hua Chou

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

The undercut issue of the CuNiSn2.5Ag microbump has been solved by reducing the Cu seed layer thickness and dry etching, but the bump height uniformity was degraded. Therefore, microjoints with different standoff heights were acquired by both thermocompressive bonding and reflow soldering. The numerical analyses indicated that the microjoints with a lower standoff sustained a higher fatigue stress under temperature cycling and the growth of Ni 3Sn 4 layer was more rapid because of a shorter diffusion route, which hastened the formation of micropores in the interconnection zone and was the root-cause of early failure.

Original languageEnglish
JournalElectrochemical and Solid-State Letters
Volume15
Issue number3
DOIs
Publication statusPublished - 2012 Jan 23

All Science Journal Classification (ASJC) codes

  • Chemical Engineering(all)
  • Materials Science(all)
  • Physical and Theoretical Chemistry
  • Electrochemistry
  • Electrical and Electronic Engineering

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