EB Resist characteristics of water soluble poly(siloxyethylene glycol)

Hidetoshi Aoki; Takashi Tokuda; Yukio Nagasaki; Masao Kato

doi:10.2494/photopolymer.10.325

EB Resist characteristics of water soluble poly(siloxyethylene glycol)

Hidetoshi Aoki
, Takashi Tokuda
, Yukio Nagasaki
, Masao Kato

Center of Applied Nanomedicine

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	325-328
Number of pages	4
Journal	Journal of Photopolymer Science and Technology
Volume	10
Issue number	2
DOIs	https://doi.org/10.2494/photopolymer.10.325
Publication status	Published - 1997

All Science Journal Classification (ASJC) codes

Polymers and Plastics
Organic Chemistry
Materials Chemistry

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10.2494/photopolymer.10.325

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@article{d085269abf47451285dcb24f41d479a7,

title = "EB Resist characteristics of water soluble poly(siloxyethylene glycol)",

author = "Hidetoshi Aoki and Takashi Tokuda and Yukio Nagasaki and Masao Kato",

year = "1997",

doi = "10.2494/photopolymer.10.325",

language = "English",

volume = "10",

pages = "325--328",

journal = "Journal of Photopolymer Science and Technology",

issn = "0914-9244",

publisher = "Tokai University",

number = "2",

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TY - JOUR

T1 - EB Resist characteristics of water soluble poly(siloxyethylene glycol)

AU - Aoki, Hidetoshi

AU - Tokuda, Takashi

AU - Nagasaki, Yukio

AU - Kato, Masao

PY - 1997

Y1 - 1997

UR - https://www.scopus.com/pages/publications/33745544714

UR - https://www.scopus.com/pages/publications/33745544714#tab=citedBy

U2 - 10.2494/photopolymer.10.325

DO - 10.2494/photopolymer.10.325

M3 - Article

AN - SCOPUS:33745544714

SN - 0914-9244

VL - 10

SP - 325

EP - 328

JO - Journal of Photopolymer Science and Technology

JF - Journal of Photopolymer Science and Technology

IS - 2

ER -

EB Resist characteristics of water soluble poly(siloxyethylene glycol)

All Science Journal Classification (ASJC) codes

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