Effect of annealing temperature on electrical and reliability characteristics of HfO2/porous low-k dielectric stacks
- Yi Lung Cheng
- , Kai Chieh Kao
- , Giin Shan Chen
- , Jau Shiung Fang
- , Chung Ren Sun
- , Wen Hsi Lee
Research output: Contribution to journal › Article › peer-review
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