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Effect of annealing temperature on electrical and reliability characteristics of HfO2/porous low-k dielectric stacks
Yi Lung Cheng, Kai Chieh Kao, Giin Shan Chen, Jau Shiung Fang, Chung Ren Sun, Wen Hsi Lee
Research output: Contribution to journal › Article › peer-review
3
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(Scopus)