Effect of cobalt content on the work function of the electrodeposited nickel-cobalt films

Chen-Kuei Chung; W. T. Chang; R. X. Zhou

doi:10.1007/s00542-007-0502-2

Effect of cobalt content on the work function of the electrodeposited nickel-cobalt films

Chen-Kuei Chung, W. T. Chang, R. X. Zhou

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

The nickel-cobalt (Ni-Co) alloy has been an important material in the MEMS or mechanical application. In this article, we investigated the effect of cobalt content on the work function (WF) variation of the electroplated Ni-Co films using a homemade Kelvin probe system. The Co atomic percentage (Co%) in the deposited films was related to the current densities. It decreased with increasing current density from 24.5 at% at 1 ASD (A/dm²) to 16.9 at% at 5 ASD. This leads to the decrease of the average measured WF of Ni-Co films with the low WF Co content from 4.974 eV at 16.9 Co% to 4.773 eV at 24.5 Co%. The sensing mechanism and analysis of Kelvin probe signal were also discussed. The in-situ nondestructive measurement using the Kelvin Probe system would be a powerful tool for future characterization of material property of micro devices.

Original language	English
Pages (from-to)	1389-1394
Number of pages	6
Journal	Microsystem Technologies
Volume	14
Issue number	9-11
DOIs	https://doi.org/10.1007/s00542-007-0502-2
Publication status	Published - 2008 Oct 1

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Hardware and Architecture
Electrical and Electronic Engineering

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Effect of cobalt content on the work function of the electrodeposited nickel-cobalt films

Abstract

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