Effect of H2 addition on SiCN film growth in an electron cyclotron resonance plasma chemical vapor deposition reactor

Jih Jen Wu, Kuei Hsien Chen, Cheng Yen Wen, Li Chyong Chen, Juen Kai Wang, Yueh Chung Yu, Chang Wan Wang, Erh Kang Lin

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds