Engineering & Materials Science
Reactive sputtering
100%
Nickel oxide
99%
Spectrometry
82%
Oxide films
78%
Ultraviolet visible spectroscopy
59%
Rutherford backscattering spectroscopy
58%
Heat treatment
55%
Photoelectrons
49%
Carrier concentration
44%
Magnetron sputtering
42%
X ray diffraction analysis
39%
Crystallinity
38%
Differential scanning calorimetry
35%
Thermogravimetric analysis
35%
Phase transitions
32%
Atoms
32%
Annealing
31%
Thin films
29%
X rays
28%
Flow rate
23%
Temperature
12%
Chemical Compounds
Reactive Sputtering
94%
Nonstoichiometric Compound
70%
Heat Treatment
53%
Rutherford Backscattering Spectroscopy
40%
Nitrogen
38%
Magnetron Sputtering
36%
Oxide
34%
X-Ray Diffractometry
33%
Interstitial
33%
Transmittance
31%
Photoelectron Spectroscopy
31%
Liquid Film
30%
Oxygen Atom
25%
Annealing
24%
Flow Kinetics
24%
Crystallinity
24%
Differential Scanning Calorimetry
22%
Thermogravimetric Analysis
22%
UV/VIS Spectroscopy
19%
X-Ray
19%
Weight
16%
Physics & Astronomy
nickel oxides
79%
oxide films
56%
heat treatment
51%
sputtering
49%
spectroscopy
33%
nitrogen
30%
oxygen atoms
21%
x rays
18%
photoelectrons
18%
backscattering
18%
crystallinity
18%
heat measurement
18%
radio frequencies
18%
interstitials
18%
magnetron sputtering
17%
transmittance
17%
flow velocity
16%
scanning
13%
annealing
12%
configurations
11%
thin films
10%
temperature
6%