Effect of nitrogen flow ratios on microstructure and mechanical properties of nanocomposite Ti-Si-N thin flims

C. K. Chung, J. J. Jhu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

In this study, the nanocomposite Ti-Si-N thin flims were prepared by reactive magnetron co-sputtering system. The Ti-Si-N film is a mixed composite consisting of the Ti-Si, Ti-N and Si-N compounds. The TiN phase is polycrystalline while SiNx is amorphous. As Si is added to the Ti-N compound to form Ti-Si-N, the microstructure becomes nanocrystalline grains embedded in an amorphous matrix i.e. nanocomposite quasiamorphous microstructure, which is also affected by the nitrogen flow ratio (FN2%) during co-sputtering. Therefore, the aim is to study the evolution of microstucture and mechanical properties of Ti-Si-N at different FN2%. The thickness, structure, morphology, chemical composition and mechanical properties of films were characterized by alpha-stepper profiler, Grazing Incidence X-ray Diffraction (GIXRD), scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS) and nanoindenter, respectively. The experimental result shows that the deposition rate decreased with increasing N2 flow rate. According to Scherrer's formula, the grain size of films was below 5 nm. The surface morphology each film was very smooth due to fine grains. The maximum hardness was 21.5 GPa and H3/E*2 ratio was 0.321 at 7 FN% which was found at the transformation between polycrystalline and amorphous phases.

Original languageEnglish
Title of host publication4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009
Pages783-786
Number of pages4
DOIs
Publication statusPublished - 2009 Oct 12
Event4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009 - Shenzhen, China
Duration: 2009 Jan 52009 Jan 8

Publication series

Name4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009

Other

Other4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009
CountryChina
CityShenzhen
Period09-01-0509-01-08

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

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