Effect of periods on wear performance of TiN/AlN superlattice films

S. H. Yao; W. H. Kao; Y. L. Su; T. H. Liu

doi:10.1016/j.msea.2004.10.017

Effect of periods on wear performance of TiN/AlN superlattice films

S. H. Yao
, W. H. Kao
, Y. L. Su
, T. H. Liu

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

26 Citations (Scopus)

Abstract

In this study, the TiN/AlN superlattice films were prepared using a newly developed high-rate reactive sputtering set-up, which featured an unbalanced and a balanced magnetron sputtering system. The former was employed to deposit the A1N film, and the latter the TiN film. The aim of this study was to obtain, through controlling the deposition conditions, a group of TiN/AlN superlattice films with various periods, and then to investigate the influence of periods on their fundamental properties and wear behavior. The results revealed that the TiN/AlN superlattice films with periods ranging from 2.4 to 67.6 nm were obtained. At periods ≦ 3.6 nm, the films had extremely high hardness, excellent adhesion and wear performance, as compared with the traditional single-layer TiN film.

Original language	English
Pages (from-to)	380-385
Number of pages	6
Journal	Materials Science & Engineering A: Structural Materials: Properties, Microstructure and Processing
Volume	392
Issue number	1-2
DOIs	https://doi.org/10.1016/j.msea.2004.10.017
Publication status	Published - 2005 Feb 15

All Science Journal Classification (ASJC) codes

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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10.1016/j.msea.2004.10.017

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title = "Effect of periods on wear performance of TiN/AlN superlattice films",

abstract = "In this study, the TiN/AlN superlattice films were prepared using a newly developed high-rate reactive sputtering set-up, which featured an unbalanced and a balanced magnetron sputtering system. The former was employed to deposit the A1N film, and the latter the TiN film. The aim of this study was to obtain, through controlling the deposition conditions, a group of TiN/AlN superlattice films with various periods, and then to investigate the influence of periods on their fundamental properties and wear behavior. The results revealed that the TiN/AlN superlattice films with periods ranging from 2.4 to 67.6 nm were obtained. At periods ≦ 3.6 nm, the films had extremely high hardness, excellent adhesion and wear performance, as compared with the traditional single-layer TiN film.",

author = "Yao, \{S. H.\} and Kao, \{W. H.\} and Su, \{Y. L.\} and Liu, \{T. H.\}",

note = "Funding Information: The authors wish to express their thanks for the finical support by National Science Council under the contract of NSC92—2212—E—309—001. Grateful thanks are specially dedicated to Mr. K.L. Yei for help in executing the experiments and to Mr. W.C. Liu for deposition in Metal Industrials Research and Development Center. ",

year = "2005",

month = feb,

day = "15",

doi = "10.1016/j.msea.2004.10.017",

language = "English",

volume = "392",

pages = "380--385",

journal = "Materials Science \& Engineering A: Structural Materials: Properties, Microstructure and Processing",

issn = "0921-5093",

publisher = "Elsevier Limited",

number = "1-2",

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TY - JOUR

T1 - Effect of periods on wear performance of TiN/AlN superlattice films

AU - Yao, S. H.

AU - Kao, W. H.

AU - Su, Y. L.

AU - Liu, T. H.

N1 - Funding Information: The authors wish to express their thanks for the finical support by National Science Council under the contract of NSC92—2212—E—309—001. Grateful thanks are specially dedicated to Mr. K.L. Yei for help in executing the experiments and to Mr. W.C. Liu for deposition in Metal Industrials Research and Development Center.

PY - 2005/2/15

Y1 - 2005/2/15

N2 - In this study, the TiN/AlN superlattice films were prepared using a newly developed high-rate reactive sputtering set-up, which featured an unbalanced and a balanced magnetron sputtering system. The former was employed to deposit the A1N film, and the latter the TiN film. The aim of this study was to obtain, through controlling the deposition conditions, a group of TiN/AlN superlattice films with various periods, and then to investigate the influence of periods on their fundamental properties and wear behavior. The results revealed that the TiN/AlN superlattice films with periods ranging from 2.4 to 67.6 nm were obtained. At periods ≦ 3.6 nm, the films had extremely high hardness, excellent adhesion and wear performance, as compared with the traditional single-layer TiN film.

AB - In this study, the TiN/AlN superlattice films were prepared using a newly developed high-rate reactive sputtering set-up, which featured an unbalanced and a balanced magnetron sputtering system. The former was employed to deposit the A1N film, and the latter the TiN film. The aim of this study was to obtain, through controlling the deposition conditions, a group of TiN/AlN superlattice films with various periods, and then to investigate the influence of periods on their fundamental properties and wear behavior. The results revealed that the TiN/AlN superlattice films with periods ranging from 2.4 to 67.6 nm were obtained. At periods ≦ 3.6 nm, the films had extremely high hardness, excellent adhesion and wear performance, as compared with the traditional single-layer TiN film.

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DO - 10.1016/j.msea.2004.10.017

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AN - SCOPUS:13144264103

SN - 0921-5093

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EP - 385

JO - Materials Science & Engineering A: Structural Materials: Properties, Microstructure and Processing

JF - Materials Science & Engineering A: Structural Materials: Properties, Microstructure and Processing

IS - 1-2

ER -

Effect of periods on wear performance of TiN/AlN superlattice films

Abstract

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