Effect of silicon doped quantum barriers on nitride-based light emitting diodes

T. H. Chiang, Y. Z. Chiou, S. J. Chang, T. K. Lin, S. P. Chang

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

This study reports the fabrication of InGaN/GaN multiple-quantum-well (MQW) light-emitting diodes (LEDs) with different Si-doped concentration in GaN barrier layers. The light output power and electrostatic discharge (ESD) characteristics of the LEDs improved as Si-doped concentration in GaN barrier layers increased. This result is attributed to the improvement in hole confinement by doping silicon in the GaN barriers. The light intensity of the LED with a 2 × 1018/cm3 silicon doping barrier layer was less sensitive to elevated temperature.

Original languageEnglish
Pages (from-to)H836-H839
JournalJournal of the Electrochemical Society
Volume158
Issue number8
DOIs
Publication statusPublished - 2011 Aug 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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