Effect of SiO2 layers on electroluminescence from Si nanocrystal/SiO2 superlattices prepared using argon ion beam assisted sputtering

Sheng Wen Fu, Hui Ju Chen, Hsuan Ta Wu, Chuan-Feng Shih

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

This study investigated the electroluminescence (EL) properties of Si-rich oxide (SRO)/SiO2 superlattices light emitting devices (LEDs). Each SiO2 layer of the superlattices was prepared by using argon ion beam assisted sputtering (IBAS). Transmission electron microscopy revealed that the treatment of Ar ion beams on the SiO2 layers did not affect the size or distribution of the Si nanocrystals in the SRO layers, but enhanced the thin-film quality of the SiO2 and formed a clear SiO2/SRO interface. The refractive index of SiO2 was increased by IBAS because of an increase in the density of SiO2. The EL efficiency was doubled for the IBAS device compared with that of a reference device. According to the retention property, the enhanced EL intensity of the IBAS device was ascribed to lower the charge loss rate through enhancing injection barrier of SiO2. The mechanism of the EL enhancement of the IBAS LED was discussed.

Original languageEnglish
Pages (from-to)59-62
Number of pages4
JournalVacuum
Volume126
DOIs
Publication statusPublished - 2016 Apr 1

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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