The titanium dioxide (TiO2) material has attracted great attentions because of its wide application in photocatalyst and optoelectronics devices. The microstructure and photoluminescence behavior of TiO2 thin films are related to the fabrication and annealing methods. In this article, the amorphous titanium oxide thin films were prepared by sol gel process with a mixture of tetraisopropyl orthotitanate, acetonylacetone, distilled water and alcohol at various molar ratios and then spin-coated on the p-Si(100) substrate. Subsequently, the CO2 laser irradiation at a power of 1.5W was utilized for annealing treatment to form crystalline rutile TiO2 instead of conventional furnace annealing. The evolution of microstructure, bonding and photoluminescence (PL) of TiO2 films were characterized by grazing incidence X-ray diffraction (GIXRD), scanning electron microscopy, Fourier transform infrared spectrometer and PL spectrometer. GIXRD showed that the crystalline phase of TiO2 after 1.5W laser annealing was rutile. The PL spectra of annealed films covered broad wavelengths of 350-800 nm which extends conventional ultraviolet range. They can be deconvoluted into three peaks at about 411, 441 and 534 nm which were attributed to the lattice emission, deep-level emissions from oxygen vacancies and defect states from bonding of extra impurities of Ti, O and C in rutile TiO2 together with residual organics. The relationship between the process parameters, microstructure, bonding and PL behavior were further discussed and established.
All Science Journal Classification (ASJC) codes
- Mechanics of Materials
- Mechanical Engineering
- Metals and Alloys
- Materials Chemistry