The dependence of the step coverage of plasma enhanced chemical vapor deposited (PECVD) tetraethylorthosilicate (PE-TEOS) oxide film on the type of substrate was examined. Results showed that increasing the deposition time did not impact the effect of the substrate on the PE-TEOS deposition rate. The SiO 2 substrate led to highest deposition rate during the initial deposition period of 5 s.
|Number of pages||6|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|Publication status||Published - 2003 Jul 1|
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Electrical and Electronic Engineering