Effect of substrate on the step coverage of plasma-enhanced chemical-vapor deposited tetraethylorthoslllcate films

Jin Kun Lan, Ylng Lang Wang, Chuen Guang Chao, Kuang-Yao Lo, Yi Lung Cheng

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

The dependence of the step coverage of plasma enhanced chemical vapor deposited (PECVD) tetraethylorthosilicate (PE-TEOS) oxide film on the type of substrate was examined. Results showed that increasing the deposition time did not impact the effect of the substrate on the PE-TEOS deposition rate. The SiO 2 substrate led to highest deposition rate during the initial deposition period of 5 s.

Original languageEnglish
Pages (from-to)1224-1229
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume21
Issue number4
Publication statusPublished - 2003 Jul 1

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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