Abstract
The dependence of the step coverage of plasma enhanced chemical vapor deposited (PECVD) tetraethylorthosilicate (PE-TEOS) oxide film on the type of substrate was examined. Results showed that increasing the deposition time did not impact the effect of the substrate on the PE-TEOS deposition rate. The SiO 2 substrate led to highest deposition rate during the initial deposition period of 5 s.
| Original language | English |
|---|---|
| Pages (from-to) | 1224-1229 |
| Number of pages | 6 |
| Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| Volume | 21 |
| Issue number | 4 |
| Publication status | Published - 2003 Jul 1 |
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Electrical and Electronic Engineering