Effect of temperature on the deposition of ZnO thin films by successive ionic layer adsorption and reaction

Shih Chang Shei, Pay Yu Lee, Shoou-Jinn Chang

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

In this study, ZnO thin films were deposited on glass substrates by the successive ionic layer adsorption and reaction (SILAR) method, and the effect of the temperature treatment in ethylene glycol on the crystal structure, surface morphology, and optical properties of the films were investigated. When the temperature was below 85 °C, the ZnO films showed poor optical transmission and had a rough surface crystal structure. As the temperature was increased, dense polycrystalline films with uniform ZnO grain distribution were obtained. The optical transmittance of the ZnO thin films fabricated at temperatures greater than 95 °C was very high (90%) in the visible-light region. Therefore, it could be concluded that increasing the temperature of treatment in ethylene glycol helps in obtaining fine-grained ZnO films with a high growth rate and a low concentration of oxygen vacancies. However, temperatures greater than 145 °C led to shedding of ZnO from the surface and a reduction in the growth rate. Thus, temperature treatment was confirmed to play an important role in ZnO film deposition instead of post thermal annealing after the film growth.

Original languageEnglish
Pages (from-to)8109-8116
Number of pages8
JournalApplied Surface Science
Volume258
Issue number20
DOIs
Publication statusPublished - 2012 Aug 1

Fingerprint

Adsorption
Thin films
Ethylene Glycol
Temperature
Ethylene glycol
Crystal structure
Opacity
Film growth
Oxygen vacancies
Light transmission
Surface morphology
Optical properties
Annealing
Glass
Substrates

All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films

Cite this

@article{db5c5c8cd6e44a5281802cfdeab6027c,
title = "Effect of temperature on the deposition of ZnO thin films by successive ionic layer adsorption and reaction",
abstract = "In this study, ZnO thin films were deposited on glass substrates by the successive ionic layer adsorption and reaction (SILAR) method, and the effect of the temperature treatment in ethylene glycol on the crystal structure, surface morphology, and optical properties of the films were investigated. When the temperature was below 85 °C, the ZnO films showed poor optical transmission and had a rough surface crystal structure. As the temperature was increased, dense polycrystalline films with uniform ZnO grain distribution were obtained. The optical transmittance of the ZnO thin films fabricated at temperatures greater than 95 °C was very high (90{\%}) in the visible-light region. Therefore, it could be concluded that increasing the temperature of treatment in ethylene glycol helps in obtaining fine-grained ZnO films with a high growth rate and a low concentration of oxygen vacancies. However, temperatures greater than 145 °C led to shedding of ZnO from the surface and a reduction in the growth rate. Thus, temperature treatment was confirmed to play an important role in ZnO film deposition instead of post thermal annealing after the film growth.",
author = "Shei, {Shih Chang} and Lee, {Pay Yu} and Shoou-Jinn Chang",
year = "2012",
month = "8",
day = "1",
doi = "10.1016/j.apsusc.2012.05.004",
language = "English",
volume = "258",
pages = "8109--8116",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier",
number = "20",

}

Effect of temperature on the deposition of ZnO thin films by successive ionic layer adsorption and reaction. / Shei, Shih Chang; Lee, Pay Yu; Chang, Shoou-Jinn.

In: Applied Surface Science, Vol. 258, No. 20, 01.08.2012, p. 8109-8116.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Effect of temperature on the deposition of ZnO thin films by successive ionic layer adsorption and reaction

AU - Shei, Shih Chang

AU - Lee, Pay Yu

AU - Chang, Shoou-Jinn

PY - 2012/8/1

Y1 - 2012/8/1

N2 - In this study, ZnO thin films were deposited on glass substrates by the successive ionic layer adsorption and reaction (SILAR) method, and the effect of the temperature treatment in ethylene glycol on the crystal structure, surface morphology, and optical properties of the films were investigated. When the temperature was below 85 °C, the ZnO films showed poor optical transmission and had a rough surface crystal structure. As the temperature was increased, dense polycrystalline films with uniform ZnO grain distribution were obtained. The optical transmittance of the ZnO thin films fabricated at temperatures greater than 95 °C was very high (90%) in the visible-light region. Therefore, it could be concluded that increasing the temperature of treatment in ethylene glycol helps in obtaining fine-grained ZnO films with a high growth rate and a low concentration of oxygen vacancies. However, temperatures greater than 145 °C led to shedding of ZnO from the surface and a reduction in the growth rate. Thus, temperature treatment was confirmed to play an important role in ZnO film deposition instead of post thermal annealing after the film growth.

AB - In this study, ZnO thin films were deposited on glass substrates by the successive ionic layer adsorption and reaction (SILAR) method, and the effect of the temperature treatment in ethylene glycol on the crystal structure, surface morphology, and optical properties of the films were investigated. When the temperature was below 85 °C, the ZnO films showed poor optical transmission and had a rough surface crystal structure. As the temperature was increased, dense polycrystalline films with uniform ZnO grain distribution were obtained. The optical transmittance of the ZnO thin films fabricated at temperatures greater than 95 °C was very high (90%) in the visible-light region. Therefore, it could be concluded that increasing the temperature of treatment in ethylene glycol helps in obtaining fine-grained ZnO films with a high growth rate and a low concentration of oxygen vacancies. However, temperatures greater than 145 °C led to shedding of ZnO from the surface and a reduction in the growth rate. Thus, temperature treatment was confirmed to play an important role in ZnO film deposition instead of post thermal annealing after the film growth.

UR - http://www.scopus.com/inward/record.url?scp=84862564656&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84862564656&partnerID=8YFLogxK

U2 - 10.1016/j.apsusc.2012.05.004

DO - 10.1016/j.apsusc.2012.05.004

M3 - Article

AN - SCOPUS:84862564656

VL - 258

SP - 8109

EP - 8116

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

IS - 20

ER -