Effect of thickness on the structural and optical properties of ZnO films by r.f. magnetron sputtering

Su Shia Lin, Jow Lay Huang

Research output: Contribution to journalArticlepeer-review

183 Citations (Scopus)

Abstract

In this study, the ZnO films were deposited to different thicknesses by r.f. magnetron sputtering. X-Ray diffraction and pole-figure analysis were used to study the crystallinity and crystal orientation. The results showed that ZnO films deposited to a thickness below 500 nm were polycrystalline with a c-axis preferential orientation. However, ZnO films, 500 or 600 nm in thickness, exhibited good self-texture. The optical properties of ZnO films did not depend significantly on the crystallographic orientation or degree of texturing. They were mainly affected by the grain size and carrier concentration.

Original languageEnglish
Pages (from-to)222-227
Number of pages6
JournalSurface and Coatings Technology
Volume185
Issue number2-3
DOIs
Publication statusPublished - 2004 Jul 22

All Science Journal Classification (ASJC) codes

  • General Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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