Effect of underlying silicon film on the evolution of microstructure and hardness of the high-temperature annealed carbon film on Si substrate

C. K. Chung, B. H. Wu

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Effects of an amorphous silicon underlayer on the evolution of microstructure and hardness of an amorphous carbon film annealed at 900 °C for 0.5-1.5 h were investigated. The two-layer carbon/silicon film after annealing resulted in higher sp2/sp3 bonding ratio but lower hardness reduction compared to the single carbon film at the same total film thickness. The improved hardness reduction of the high-temperature annealed carbon film is attributed to the formation of polycrystals of the amorphous silicon together with the residual compressive stress of the two-layer C/Si films.

Original languageEnglish
Pages (from-to)2369-2372
Number of pages4
JournalMaterials Letters
Volume63
Issue number27
DOIs
Publication statusPublished - 2009 Nov 15

Fingerprint

Carbon films
Silicon
silicon films
hardness
Hardness
Amorphous silicon
microstructure
Microstructure
carbon
Substrates
amorphous silicon
Amorphous carbon
Polycrystals
Amorphous films
Compressive stress
Temperature
Film thickness
Residual stresses
polycrystals
Carbon

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

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abstract = "Effects of an amorphous silicon underlayer on the evolution of microstructure and hardness of an amorphous carbon film annealed at 900 °C for 0.5-1.5 h were investigated. The two-layer carbon/silicon film after annealing resulted in higher sp2/sp3 bonding ratio but lower hardness reduction compared to the single carbon film at the same total film thickness. The improved hardness reduction of the high-temperature annealed carbon film is attributed to the formation of polycrystals of the amorphous silicon together with the residual compressive stress of the two-layer C/Si films.",
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Effect of underlying silicon film on the evolution of microstructure and hardness of the high-temperature annealed carbon film on Si substrate. / Chung, C. K.; Wu, B. H.

In: Materials Letters, Vol. 63, No. 27, 15.11.2009, p. 2369-2372.

Research output: Contribution to journalArticle

TY - JOUR

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AU - Chung, C. K.

AU - Wu, B. H.

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