Effects of gas residence time on microwave plasma enhanced CVD of ultrananocrystalline diamond in mixtures of methane and argon without hydrogen or oxygen additives

Ji Heng Jiang, Yueh Chieh Chu, Wei Cheng Fang, Shih Tse Chen, Yon-Hua Tzeng

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

For low-power and low-temperature microwave plasma CVD of UNCD in gas mixtures of methane and argon without hydrogen and oxygen additives, excessive carbon containing species often induce gas phase synthesis of non-diamond carbon phases, which fall on diamond growing surfaces to become part of the deposited diamond films. To prevent undesirable gas phase reactions, effects of gas residence time, or equivalently, the total gas flow rate at a fixed gas pressure and compositions, on the microwave plasma and its deposition of UNCD are studied. The gas residence time is increased by by-passing an increasing amount of a pre-set mixture of methane and argon at a fixed total flow rate through a mass flow controller to a vacuum pump while allowing the rest of the gas feed to flow through the reaction chamber. The gas composition, gas pressure, microwave power, and substrate temperature are kept constant. Optimization of the UNCD growth is, thus, achieved by increasing the gas residence time to deposit UNCD of high phase purity.

Original languageEnglish
Pages (from-to)153-157
Number of pages5
JournalDiamond and Related Materials
Volume24
DOIs
Publication statusPublished - 2012 Apr 1

Fingerprint

Diamond
Argon
Methane
Plasma enhanced chemical vapor deposition
Hydrogen
Diamonds
methane
Gases
diamonds
Microwaves
argon
vapor deposition
Oxygen
microwaves
gas composition
oxygen
hydrogen
gases
gas pressure
flow velocity

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

Cite this

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title = "Effects of gas residence time on microwave plasma enhanced CVD of ultrananocrystalline diamond in mixtures of methane and argon without hydrogen or oxygen additives",
abstract = "For low-power and low-temperature microwave plasma CVD of UNCD in gas mixtures of methane and argon without hydrogen and oxygen additives, excessive carbon containing species often induce gas phase synthesis of non-diamond carbon phases, which fall on diamond growing surfaces to become part of the deposited diamond films. To prevent undesirable gas phase reactions, effects of gas residence time, or equivalently, the total gas flow rate at a fixed gas pressure and compositions, on the microwave plasma and its deposition of UNCD are studied. The gas residence time is increased by by-passing an increasing amount of a pre-set mixture of methane and argon at a fixed total flow rate through a mass flow controller to a vacuum pump while allowing the rest of the gas feed to flow through the reaction chamber. The gas composition, gas pressure, microwave power, and substrate temperature are kept constant. Optimization of the UNCD growth is, thus, achieved by increasing the gas residence time to deposit UNCD of high phase purity.",
author = "Jiang, {Ji Heng} and Chu, {Yueh Chieh} and Fang, {Wei Cheng} and Chen, {Shih Tse} and Yon-Hua Tzeng",
year = "2012",
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doi = "10.1016/j.diamond.2012.01.003",
language = "English",
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}

Effects of gas residence time on microwave plasma enhanced CVD of ultrananocrystalline diamond in mixtures of methane and argon without hydrogen or oxygen additives. / Jiang, Ji Heng; Chu, Yueh Chieh; Fang, Wei Cheng; Chen, Shih Tse; Tzeng, Yon-Hua.

In: Diamond and Related Materials, Vol. 24, 01.04.2012, p. 153-157.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Effects of gas residence time on microwave plasma enhanced CVD of ultrananocrystalline diamond in mixtures of methane and argon without hydrogen or oxygen additives

AU - Jiang, Ji Heng

AU - Chu, Yueh Chieh

AU - Fang, Wei Cheng

AU - Chen, Shih Tse

AU - Tzeng, Yon-Hua

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AB - For low-power and low-temperature microwave plasma CVD of UNCD in gas mixtures of methane and argon without hydrogen and oxygen additives, excessive carbon containing species often induce gas phase synthesis of non-diamond carbon phases, which fall on diamond growing surfaces to become part of the deposited diamond films. To prevent undesirable gas phase reactions, effects of gas residence time, or equivalently, the total gas flow rate at a fixed gas pressure and compositions, on the microwave plasma and its deposition of UNCD are studied. The gas residence time is increased by by-passing an increasing amount of a pre-set mixture of methane and argon at a fixed total flow rate through a mass flow controller to a vacuum pump while allowing the rest of the gas feed to flow through the reaction chamber. The gas composition, gas pressure, microwave power, and substrate temperature are kept constant. Optimization of the UNCD growth is, thus, achieved by increasing the gas residence time to deposit UNCD of high phase purity.

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