Effects of plasma treatment on the electrical and optical properties of indium tin oxide films fabricated by r.f. reactive sputtering

Ching Ting Lee; Qing Xuan Yu; Bang Tai Tang; Hsin Ying Lee

doi:10.1016/S0040-6090(01)00777-5

Effects of plasma treatment on the electrical and optical properties of indium tin oxide films fabricated by r.f. reactive sputtering

Ching Ting Lee, Qing Xuan Yu, Bang Tai Tang, Hsin Ying Lee

Department of Photonics

Research output: Contribution to journal › Article › peer-review

46 Citations (Scopus)

Abstract

In this study, indium tin oxide (ITO) films were fabricated by r.f. reactive sputtering on glass substrates at room temperature. After the deposition process, the films were treated by oxygen and (30% H₂+70% N₂) gas mixture plasma, respectively. The effect of the plasma treatments on the electrical and optical properties of ITO films was then investigated. It was found that such parameters as the period and number of the plasma treatment had a great influence on the optoelectronic properties of the films. The property variation of the plasma treated films differed for the oxygen and the (30% H₂+70% N₂) gas mixtures. Some potential applications of plasma treated films are also discussed.

Original language	English
Pages (from-to)	105-110
Number of pages	6
Journal	Thin Solid Films
Volume	386
Issue number	1
DOIs	https://doi.org/10.1016/S0040-6090(01)00777-5
Publication status	Published - 2001 May 1

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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@article{36dc86f8e0ff4cb593d3fc745137e398,

title = "Effects of plasma treatment on the electrical and optical properties of indium tin oxide films fabricated by r.f. reactive sputtering",

abstract = "In this study, indium tin oxide (ITO) films were fabricated by r.f. reactive sputtering on glass substrates at room temperature. After the deposition process, the films were treated by oxygen and (30% H2+70% N2) gas mixture plasma, respectively. The effect of the plasma treatments on the electrical and optical properties of ITO films was then investigated. It was found that such parameters as the period and number of the plasma treatment had a great influence on the optoelectronic properties of the films. The property variation of the plasma treated films differed for the oxygen and the (30% H2+70% N2) gas mixtures. Some potential applications of plasma treated films are also discussed.",

author = "Lee, {Ching Ting} and Yu, {Qing Xuan} and Tang, {Bang Tai} and Lee, {Hsin Ying}",

year = "2001",

month = may,

day = "1",

doi = "10.1016/S0040-6090(01)00777-5",

language = "English",

volume = "386",

pages = "105--110",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

number = "1",

}

TY - JOUR

T1 - Effects of plasma treatment on the electrical and optical properties of indium tin oxide films fabricated by r.f. reactive sputtering

AU - Lee, Ching Ting

AU - Yu, Qing Xuan

AU - Tang, Bang Tai

AU - Lee, Hsin Ying

PY - 2001/5/1

Y1 - 2001/5/1

N2 - In this study, indium tin oxide (ITO) films were fabricated by r.f. reactive sputtering on glass substrates at room temperature. After the deposition process, the films were treated by oxygen and (30% H2+70% N2) gas mixture plasma, respectively. The effect of the plasma treatments on the electrical and optical properties of ITO films was then investigated. It was found that such parameters as the period and number of the plasma treatment had a great influence on the optoelectronic properties of the films. The property variation of the plasma treated films differed for the oxygen and the (30% H2+70% N2) gas mixtures. Some potential applications of plasma treated films are also discussed.

AB - In this study, indium tin oxide (ITO) films were fabricated by r.f. reactive sputtering on glass substrates at room temperature. After the deposition process, the films were treated by oxygen and (30% H2+70% N2) gas mixture plasma, respectively. The effect of the plasma treatments on the electrical and optical properties of ITO films was then investigated. It was found that such parameters as the period and number of the plasma treatment had a great influence on the optoelectronic properties of the films. The property variation of the plasma treated films differed for the oxygen and the (30% H2+70% N2) gas mixtures. Some potential applications of plasma treated films are also discussed.

UR - http://www.scopus.com/inward/record.url?scp=0035341641&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035341641&partnerID=8YFLogxK

U2 - 10.1016/S0040-6090(01)00777-5

DO - 10.1016/S0040-6090(01)00777-5

M3 - Article

AN - SCOPUS:0035341641

SN - 0040-6090

VL - 386

SP - 105

EP - 110

JO - Thin Solid Films

JF - Thin Solid Films

IS - 1

ER -

Effects of plasma treatment on the electrical and optical properties of indium tin oxide films fabricated by r.f. reactive sputtering

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