Effects of process conditions on the synthesis and microstructure of nano-scale metal-containing amorphous carbon thin films

Wan Yu Wu, Jyh Ming Ting

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

Thin films of metal-containing amorphous carbon (a-C:Me) were deposited on a number of substrates, including silicon, Pt coated silicon, carbon coated silicon, polymer, and glass. The deposition was performed in a dc reactive sputter deposition system equipped with one single magnetron gun. The gases used were various mixtures of CH4 + Ar. The gas mixture was admitted to the deposition chamber at constant flow rate and ratio. Self-assembled alternating layer structure was observed under certain deposition conditions. Correlation between the self-assembled alternating layer structure and deposition parameters is presented and discussed. The role of carbon energy in the segregation of metal and carbon to form the layer structure is addressed.

Original languageEnglish
Pages (from-to)2623-2626
Number of pages4
JournalJournal of Nanoscience and Nanotechnology
Volume8
Issue number5
Publication statusPublished - 2008 May

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Biomedical Engineering
  • Materials Science(all)
  • Condensed Matter Physics

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