Effects of r.f. bias and nitrogen flow rates on the reactive sputtering of TiAlN films

Bor Yuan Shew, Jow Lay Huang, Ding Fwu Lii

Research output: Contribution to journalArticle

61 Citations (Scopus)

Abstract

The effects of r.f. bias and nitrogen flow on the microstructure and mechanical properties of TiAlN films were investigated. The preferred orientations, grain size, density, adhesive strength and hardness were substantially affected by substrate bias and nitrogen flow rate. The optimized wear resistance occurred 6 ml min-1 higher than the critical N2 flow rate at which a stoichiometric composition could be obtained. This could be related to different kinetics of nitridation of Ti and Al.

Original languageEnglish
Pages (from-to)212-219
Number of pages8
JournalThin Solid Films
Volume293
Issue number1-2
DOIs
Publication statusPublished - 1997 Jan 30

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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