Effects of substrate bias and nitrogen flow ratio on the resistivity, density, stoichiometry, and crystal structure of reactively sputtered ZrN x thin films

Shin Hui Wang, Ching Chun Chang, Jen-Sue Chen

Research output: Contribution to journalArticle

25 Citations (Scopus)
Original languageEnglish
Pages (from-to)2145-2151
Number of pages7
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume22
Issue number5
DOIs
Publication statusPublished - 2004 Oct 1

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Grain size and shape
Electric conductivity
Ion bombardment
Microelectronics
Stoichiometry
Magnetron sputtering
Nitrogen
Crystal structure
Thin films
Oxidation
Substrates

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

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