Effects of substrate bias and nitrogen flow ratio on the resistivity, density, stoichiometry, and crystal structure of reactively sputtered ZrN x thin films

Shin Hui Wang, Ching Chun Chang, J. S. Chen

Research output: Contribution to journalArticlepeer-review

26 Citations (Scopus)
Original languageEnglish
Pages (from-to)2145-2151
Number of pages7
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume22
Issue number5
DOIs
Publication statusPublished - 2004 Oct 1

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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