Effects of surface treatment and annealing on properties of InN layers grown using metal organic chemical vapor deposition

Sheng Po Chang; Kuan Jen Chen; Po Jui Kuo; Yu Zung Chiou

doi:10.4028/www.scientific.net/AMM.271-272.190

Effects of surface treatment and annealing on properties of InN layers grown using metal organic chemical vapor deposition

Sheng Po Chang, Kuan Jen Chen, Po Jui Kuo, Yu Zung Chiou

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

We report the effects surface treatment and annealing had on the properties of InN layers grown using metal organic chemical vapor deposition (MOCVD). The number of defects due to N vacancies decreased significantly with increasing annealing temperature. However, when the annealing temperature reached 700°C, the crystalline grain became larger on the film surfaces. Annealing at an appropriate temperature improved the crystalline quality and the electrical properties of the InN films. However, when the annealing temperature was too high, InN oxidized and even dissociated.

Original language	English
Title of host publication	Frontiers of Manufacturing and Design Science III
Pages	190-196
Number of pages	7
Edition	PART 1
DOIs	https://doi.org/10.4028/www.scientific.net/AMM.271-272.190
Publication status	Published - 2013
Event	3rd International Conference on Frontiers of Manufacturing and Design Science, ICFMD 2012 - , Hong Kong Duration: 2012 Dec 11 → 2012 Dec 13

Publication series

Name	Applied Mechanics and Materials
Number	PART 1
Volume	271
ISSN (Print)	1660-9336
ISSN (Electronic)	1662-7482

Other

Other	3rd International Conference on Frontiers of Manufacturing and Design Science, ICFMD 2012
Country/Territory	Hong Kong
Period	12-12-11 → 12-12-13

All Science Journal Classification (ASJC) codes

General Engineering

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10.4028/www.scientific.net/AMM.271-272.190

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Chang, S. P., Chen, K. J., Kuo, P. J., & Chiou, Y. Z. (2013). Effects of surface treatment and annealing on properties of InN layers grown using metal organic chemical vapor deposition. In Frontiers of Manufacturing and Design Science III (PART 1 ed., pp. 190-196). (Applied Mechanics and Materials; Vol. 271, No. PART 1). https://doi.org/10.4028/www.scientific.net/AMM.271-272.190

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title = "Effects of surface treatment and annealing on properties of InN layers grown using metal organic chemical vapor deposition",

abstract = "We report the effects surface treatment and annealing had on the properties of InN layers grown using metal organic chemical vapor deposition (MOCVD). The number of defects due to N vacancies decreased significantly with increasing annealing temperature. However, when the annealing temperature reached 700°C, the crystalline grain became larger on the film surfaces. Annealing at an appropriate temperature improved the crystalline quality and the electrical properties of the InN films. However, when the annealing temperature was too high, InN oxidized and even dissociated.",

author = "Chang, {Sheng Po} and Chen, {Kuan Jen} and Kuo, {Po Jui} and Chiou, {Yu Zung}",

note = "Copyright: Copyright 2013 Elsevier B.V., All rights reserved.; 3rd International Conference on Frontiers of Manufacturing and Design Science, ICFMD 2012 ; Conference date: 11-12-2012 Through 13-12-2012",

year = "2013",

doi = "10.4028/www.scientific.net/AMM.271-272.190",

language = "English",

isbn = "9783037855782",

series = "Applied Mechanics and Materials",

number = "PART 1",

pages = "190--196",

booktitle = "Frontiers of Manufacturing and Design Science III",

edition = "PART 1",

}

Chang, SP, Chen, KJ, Kuo, PJ & Chiou, YZ 2013, Effects of surface treatment and annealing on properties of InN layers grown using metal organic chemical vapor deposition. in Frontiers of Manufacturing and Design Science III. PART 1 edn, Applied Mechanics and Materials, no. PART 1, vol. 271, pp. 190-196, 3rd International Conference on Frontiers of Manufacturing and Design Science, ICFMD 2012, Hong Kong, 12-12-11. https://doi.org/10.4028/www.scientific.net/AMM.271-272.190

Effects of surface treatment and annealing on properties of InN layers grown using metal organic chemical vapor deposition. / Chang, Sheng Po; Chen, Kuan Jen; Kuo, Po Jui et al.
Frontiers of Manufacturing and Design Science III. PART 1. ed. 2013. p. 190-196 (Applied Mechanics and Materials; Vol. 271, No. PART 1).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Effects of surface treatment and annealing on properties of InN layers grown using metal organic chemical vapor deposition

AU - Chang, Sheng Po

AU - Chen, Kuan Jen

AU - Kuo, Po Jui

AU - Chiou, Yu Zung

PY - 2013

Y1 - 2013

N2 - We report the effects surface treatment and annealing had on the properties of InN layers grown using metal organic chemical vapor deposition (MOCVD). The number of defects due to N vacancies decreased significantly with increasing annealing temperature. However, when the annealing temperature reached 700°C, the crystalline grain became larger on the film surfaces. Annealing at an appropriate temperature improved the crystalline quality and the electrical properties of the InN films. However, when the annealing temperature was too high, InN oxidized and even dissociated.

AB - We report the effects surface treatment and annealing had on the properties of InN layers grown using metal organic chemical vapor deposition (MOCVD). The number of defects due to N vacancies decreased significantly with increasing annealing temperature. However, when the annealing temperature reached 700°C, the crystalline grain became larger on the film surfaces. Annealing at an appropriate temperature improved the crystalline quality and the electrical properties of the InN films. However, when the annealing temperature was too high, InN oxidized and even dissociated.

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SN - 9783037855782

T3 - Applied Mechanics and Materials

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EP - 196

BT - Frontiers of Manufacturing and Design Science III

T2 - 3rd International Conference on Frontiers of Manufacturing and Design Science, ICFMD 2012

Y2 - 11 December 2012 through 13 December 2012

ER -

Effects of surface treatment and annealing on properties of InN layers grown using metal organic chemical vapor deposition

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