TY - JOUR
T1 - Effects of tip-substrate gap, deposition temperature, holding time, and pull-off velocity on dip-pen lithography investigated using molecular dynamics simulation
AU - Wu, Cheng Da
AU - Fang, Te Hua
AU - Lin, Jen Fin
N1 - Funding Information:
This work was supported by the National Science Council of Taiwan under Grant Nos. NSC 100-2628-E-151-003-MY3 and NSC 100-2221-E-151-018-MY3.
PY - 2012/5/15
Y1 - 2012/5/15
N2 - The process parameters in the dip-pen nanolithography process, including tip-substrate gap, deposition temperature, holding time, and pull-off velocity are evaluated in terms of the mechanism of molecular transference, alkanethiol meniscus characteristic, surface adsorbed energy, and pattern formation using molecular dynamics simulations. The simulation results clearly show that the optimum deposition occurs at a smaller tip-substrate gap, a slower pull-off velocity, a higher temperature, and a longer holding time. The pattern area increases with decreasing tip-substrate gap and increasing deposition temperature and holding time. With an increase in deposition temperature, the molecular transfer ability significantly increases. Pattern height is a function of meniscus length. When the pull-off velocity is decreased, the pattern height increases. The height of the neck in meniscus decreases and the neck width increases with holding time. Meniscus size increases with increasing deposition temperature and holding time.
AB - The process parameters in the dip-pen nanolithography process, including tip-substrate gap, deposition temperature, holding time, and pull-off velocity are evaluated in terms of the mechanism of molecular transference, alkanethiol meniscus characteristic, surface adsorbed energy, and pattern formation using molecular dynamics simulations. The simulation results clearly show that the optimum deposition occurs at a smaller tip-substrate gap, a slower pull-off velocity, a higher temperature, and a longer holding time. The pattern area increases with decreasing tip-substrate gap and increasing deposition temperature and holding time. With an increase in deposition temperature, the molecular transfer ability significantly increases. Pattern height is a function of meniscus length. When the pull-off velocity is decreased, the pattern height increases. The height of the neck in meniscus decreases and the neck width increases with holding time. Meniscus size increases with increasing deposition temperature and holding time.
UR - http://www.scopus.com/inward/record.url?scp=84862126581&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84862126581&partnerID=8YFLogxK
U2 - 10.1063/1.4720576
DO - 10.1063/1.4720576
M3 - Article
AN - SCOPUS:84862126581
SN - 0021-8979
VL - 111
JO - Journal of Applied Physics
JF - Journal of Applied Physics
IS - 10
M1 - 103521
ER -