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Electrical reliability issues of integrating thin Ta and TaN barriers with Cu and low-K dielectric
Zhen Cheng Wu, Chau Chiung Wang, Ren Guay Wu, Yu Lin Liu, Peng Sen Chen, Zhe Min Zhu, Mao Chieh Chen, Jiann Fu Chen, Chung I. Chang, Lai Juh Chen
Research output: Contribution to journal › Article › peer-review
17
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(Scopus)