Electrical reliability issues of integrating thin Ta and TaN barriers with Cu and low-K dielectric

Zhen Cheng Wu, Chau Chiung Wang, Ren Guay Wu, Yu Lin Liu, Peng Sen Chen, Zhe Min Zhu, Mao Chieh Chen, Jiann Fu Chen, Chung I. Chang, Lai Juh Chen

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Electrical reliability issues of integrating thin Ta and TaN barriers with Cu and low-K dielectric'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds