Abstract
Electrical stress and 10-keV x-ray and 1.8-MeV proton irradiation and annealing responses are evaluated for graphene-based nonvolatile memory devices. The memory characteristics of these structures derive primarily from hysteretic charge exchange between the graphene and interface and border traps, similar to the operation of metal-nitride-oxide-semicon-ductor memory devices. Excellent stability and memory retention are observed for ionizing radiation exposure or constant-voltage stress. Cycling of the memory state leads to a significant reduction in memory window.
Original language | English |
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Pages (from-to) | 2974-2978 |
Number of pages | 5 |
Journal | IEEE Transactions on Nuclear Science |
Volume | 59 |
Issue number | 6 |
DOIs | |
Publication status | Published - 2012 Dec |
All Science Journal Classification (ASJC) codes
- Nuclear and High Energy Physics
- Nuclear Energy and Engineering
- Electrical and Electronic Engineering