Abstract
We report a p+-n+-n+ transistor-based electro-optical modulator fabricated on silicon-on-insulator (SOI) substrate. With 100% modulation depth achieved, the rise and fall times were respectively measured to be 60 and 56 ns. The 3 dB bandwidth in the excess of 10.5 MHz was determined from the corresponding device.
Original language | English |
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Title of host publication | CLEO |
Subtitle of host publication | Science and Innovations, CLEO_SI 2011 |
Publication status | Published - 2011 |
Event | CLEO: Science and Innovations, CLEO_SI 2011 - Baltimore, MD, United States Duration: 2011 May 1 → 2011 May 6 |
Other
Other | CLEO: Science and Innovations, CLEO_SI 2011 |
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Country/Territory | United States |
City | Baltimore, MD |
Period | 11-05-01 → 11-05-06 |
All Science Journal Classification (ASJC) codes
- Instrumentation
- Atomic and Molecular Physics, and Optics