Electron emission from microwave-plasma chemically vapor deposited carbon nanotubes

Yon-Hua Tzeng, C. Liu, C. Cutshaw, Z. Chen

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

A microwave plasma CVD reactor was used for the deposition of carbon nanotubes on substrates, Hydrocarbon or oxyhydrocarbon mixtures were used as the carbon source. Hot electrons in the microwave plasma at temperatures exceeding 10,000C provided a means of dissociating the vapor or gas feedstock, heating the substrate, and allowing gas species to react in the gas phase as well as on the surface of the substrate leading to the deposition of desired carbon coatings. A high vacuum chamber was used to characterize the electron emission properties of these carbon nanotube coatings using a one-millimeter diameter tungsten rod with a hemispherical tip as the anode while the carbon nanotube coatings served as the cathode. The current-voltage characteristics of the carbon nanotube coatings were measured and used for calculating the electric field at which electron emission turned on as well as calculating the field enhancement factor of the carbon nanotubes. Field emission of electrons from carbon nanotubes starting from an electric field lower than 1 volt per micrometer has been achieved.

Original languageEnglish
JournalMaterials Research Society Symposium - Proceedings
Volume621
Publication statusPublished - 2000 Dec 1
EventElectron-Emissive Materials, Vacuum Microelectronics and Flat-Panel Displays - San Francisco, CA, United States
Duration: 2000 Apr 252000 Apr 27

Fingerprint

Carbon Nanotubes
Electron emission
electron emission
Carbon nanotubes
carbon nanotubes
Vapors
Microwaves
vapors
Plasmas
microwaves
coatings
Coatings
Gases
Substrates
Carbon
Electric fields
Plasma CVD
Tungsten
electric fields
Hot electrons

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

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abstract = "A microwave plasma CVD reactor was used for the deposition of carbon nanotubes on substrates, Hydrocarbon or oxyhydrocarbon mixtures were used as the carbon source. Hot electrons in the microwave plasma at temperatures exceeding 10,000C provided a means of dissociating the vapor or gas feedstock, heating the substrate, and allowing gas species to react in the gas phase as well as on the surface of the substrate leading to the deposition of desired carbon coatings. A high vacuum chamber was used to characterize the electron emission properties of these carbon nanotube coatings using a one-millimeter diameter tungsten rod with a hemispherical tip as the anode while the carbon nanotube coatings served as the cathode. The current-voltage characteristics of the carbon nanotube coatings were measured and used for calculating the electric field at which electron emission turned on as well as calculating the field enhancement factor of the carbon nanotubes. Field emission of electrons from carbon nanotubes starting from an electric field lower than 1 volt per micrometer has been achieved.",
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Electron emission from microwave-plasma chemically vapor deposited carbon nanotubes. / Tzeng, Yon-Hua; Liu, C.; Cutshaw, C.; Chen, Z.

In: Materials Research Society Symposium - Proceedings, Vol. 621, 01.12.2000.

Research output: Contribution to journalConference article

TY - JOUR

T1 - Electron emission from microwave-plasma chemically vapor deposited carbon nanotubes

AU - Tzeng, Yon-Hua

AU - Liu, C.

AU - Cutshaw, C.

AU - Chen, Z.

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N2 - A microwave plasma CVD reactor was used for the deposition of carbon nanotubes on substrates, Hydrocarbon or oxyhydrocarbon mixtures were used as the carbon source. Hot electrons in the microwave plasma at temperatures exceeding 10,000C provided a means of dissociating the vapor or gas feedstock, heating the substrate, and allowing gas species to react in the gas phase as well as on the surface of the substrate leading to the deposition of desired carbon coatings. A high vacuum chamber was used to characterize the electron emission properties of these carbon nanotube coatings using a one-millimeter diameter tungsten rod with a hemispherical tip as the anode while the carbon nanotube coatings served as the cathode. The current-voltage characteristics of the carbon nanotube coatings were measured and used for calculating the electric field at which electron emission turned on as well as calculating the field enhancement factor of the carbon nanotubes. Field emission of electrons from carbon nanotubes starting from an electric field lower than 1 volt per micrometer has been achieved.

AB - A microwave plasma CVD reactor was used for the deposition of carbon nanotubes on substrates, Hydrocarbon or oxyhydrocarbon mixtures were used as the carbon source. Hot electrons in the microwave plasma at temperatures exceeding 10,000C provided a means of dissociating the vapor or gas feedstock, heating the substrate, and allowing gas species to react in the gas phase as well as on the surface of the substrate leading to the deposition of desired carbon coatings. A high vacuum chamber was used to characterize the electron emission properties of these carbon nanotube coatings using a one-millimeter diameter tungsten rod with a hemispherical tip as the anode while the carbon nanotube coatings served as the cathode. The current-voltage characteristics of the carbon nanotube coatings were measured and used for calculating the electric field at which electron emission turned on as well as calculating the field enhancement factor of the carbon nanotubes. Field emission of electrons from carbon nanotubes starting from an electric field lower than 1 volt per micrometer has been achieved.

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