TY - JOUR
T1 - Electron-spin-resonance transistors for quantum computing in silicon-germanium heterostructures
AU - Vrijen, Rutger
AU - Yablonovitch, Eli
AU - Wang, Kang
AU - Jiang, Hong Wen
AU - Balandin, Alex
AU - Roychowdhury, Vwani
AU - Mor, Tal
AU - DiVincenzo, David
PY - 2000
Y1 - 2000
N2 - We apply the full power of modern electronic band-structure engineering and epitaxial heterostructures to design a transistor that can sense and control a single-donor electron spin. Spin-resonance transistors may form the technological basis for quantum information processing. One- and two-qubit operations are performed by applying a gate bias. The bias electric field pulls the electron wave function away from the dopant ion into layers of different alloy composition. Owing to the variation of the g factor [Formula Presented] this displacement changes the spin Zeeman energy, allowing single-qubit operations. By displacing the electron even further, the overlap with neighboring qubits is affected, which allows two-qubit operations. Certain silicon-germanium alloys allow a qubit spacing as large as 200 nm, which is well within the capabilities of current lithographic techniques. We discuss manufacturing limitations and issues regarding scaling up to a large size computer.
AB - We apply the full power of modern electronic band-structure engineering and epitaxial heterostructures to design a transistor that can sense and control a single-donor electron spin. Spin-resonance transistors may form the technological basis for quantum information processing. One- and two-qubit operations are performed by applying a gate bias. The bias electric field pulls the electron wave function away from the dopant ion into layers of different alloy composition. Owing to the variation of the g factor [Formula Presented] this displacement changes the spin Zeeman energy, allowing single-qubit operations. By displacing the electron even further, the overlap with neighboring qubits is affected, which allows two-qubit operations. Certain silicon-germanium alloys allow a qubit spacing as large as 200 nm, which is well within the capabilities of current lithographic techniques. We discuss manufacturing limitations and issues regarding scaling up to a large size computer.
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U2 - 10.1103/PhysRevA.62.012306
DO - 10.1103/PhysRevA.62.012306
M3 - Article
AN - SCOPUS:84862732355
SN - 1050-2947
VL - 62
SP - 10
JO - Physical Review A - Atomic, Molecular, and Optical Physics
JF - Physical Review A - Atomic, Molecular, and Optical Physics
IS - 1
ER -