Abstract
A practical field-effect spin-resonance transistor (SRT) design that might lend itself to a near-term demonstration of qubits on a silicon wafer is presented. This transistor is built by using modern electronic band-structure engineering and epitaxial growth techniques.
Original language | English |
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Pages (from-to) | 12306-12301 |
Number of pages | 6 |
Journal | Physical Review A - Atomic, Molecular, and Optical Physics |
Volume | 62 |
Issue number | 1 |
Publication status | Published - 2000 Jul |
All Science Journal Classification (ASJC) codes
- Atomic and Molecular Physics, and Optics