The shrinking CD into nano scale demands more accurate and stable dose control. Recently, the immersion lithography has added extra disturbing factors, such as bubbles, particles which directly impact on current in-line metrology and dose control performance. We present a methodology to characterize the dose metrological data and control approach to secure the metrological fidelity for accurate and stable dose control. First, the time sequence and power spectral domain analysis generate the statistical tendency which shows the confidence area of metrological feedbacks. Then, the 2nd order data fusion from both in-situ and in-line metrological channels is employed to generate a statistical significance of critical external perturbations. Thereafter, an Extended Kalman Filter (EKM) is implemented to integrate to a knowledge based autonomous calibration controller. The controller design is verified successfully to remove the critical external perturbation and to predict the next metrological calibration timing.
|Number of pages||4|
|Publication status||Published - 2006 Dec 8|
|Event||2006 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2006 Technical Proceedings - Boston, MA, United States|
Duration: 2006 May 7 → 2006 May 11
|Other||2006 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2006 Technical Proceedings|
|Period||06-05-07 → 06-05-11|
All Science Journal Classification (ASJC) codes