Enhanced electrical performance and reliability of Ti-IGZO thin-film transistors with Hf1-xAlxO gate dielectrics

Bing Cheng You, Shui Jinn Wang, Rong Ming Ko, Jhong Han Wu, Chen En Lin

Research output: Contribution to journalArticle

Abstract

A thin-film transistor (TFT) with a Ti-IGZO channel layer and Hf1-xAlxO gate dielectric is proposed to improve the performance and reliability of the device. The experimental results show that in three types of TFTs based on HfO2/IGZO, Hf1-xAlxO/IGZO and Hf1-xAlxO/Ti-IGZO gate dielectric/channel structures, the Hf0.88Al0.12O/Ti (2.0%)-IGZO TFT exhibits the best device performance with the subthreshold swing of 86 mV dec-1, field-effect mobility of 28.63 cm2V-1s-1 and on/off current ratio of 3.26 × 108. In particular, it shows a hysteresis voltage as low as 0.02 V and a threshold voltage shift after 1000 s positive/negative gate bias stress/white light illumination of 0.134 V/-0.089 V/-0.195 V, compared with 0.45 V and 0.612 V/-0.507 V/-0.657 V of the HfO2/IGZO TFT. These improvements are due to the incorporation of Ti into the IGZO channel, which reduces defect density, while adding Al to HfO2 improves surface roughness to inhibit surface scattering and charge capture during stress testing.

Original languageEnglish
Article numberSGGJ03
JournalJapanese Journal of Applied Physics
Volume59
Issue numberSG
DOIs
Publication statusPublished - 2020 Apr 1

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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