Enhanced performance of organic light-emitting devices by atmospheric plasma treatment of indium tin oxide surfaces

I. Min Chan, Weng Cheng Cheng, Franklin C. Hong

Research output: Contribution to journalArticlepeer-review

99 Citations (Scopus)

Abstract

Atmospheric plasma treatment of indium tin oxide (ITO) surfaces has been studied and demonstrated to be the most efficient method in improving the performance of vacuum-deposited double-layer organic light-emitting diode devices, among various plasma treatment methods including low-pressure Ar plasma and low-pressure O2 plasma treatment. Although with a current-voltage characteristic close to low-pressure O2 plasma treatment, the atmospheric plasma treatment exhibits a 40% increase of electroluminescence efficiency. X-ray photoelectron spectroscopy results show that the atmospheric plasma treatment increases the work function and reduces the carbon contamination of ITO surfaces. Our results suggest that atmospheric plasma treatment is a cheaper, more convenient, and more efficient method than low-pressure O2 plasma treatment for improving device performance.

Original languageEnglish
Pages (from-to)13-15
Number of pages3
JournalApplied Physics Letters
Volume80
Issue number1
DOIs
Publication statusPublished - 2002 Jan 7

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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