Enhanced polarization and mechanisms in optically pumped hyperpolarized He3 in the presence of He4

Hsin Hsien Chen; Hong Chang Yang; Herng Er Horng; Y. Y. Lee; Shu Hsien Liao; S. Y. Yang; Chung Hsien Chou; Lieh Jeng Chang; M. J. Chen; M. Y. Chern

doi:10.1103/PhysRevA.81.033422

Enhanced polarization and mechanisms in optically pumped hyperpolarized He3 in the presence of He4

Hsin Hsien Chen, Hong Chang Yang, Herng Er Horng, Y. Y. Lee, Shu Hsien Liao, S. Y. Yang, Chung Hsien Chou, Lieh Jeng Chang, M. J. Chen, M. Y. Chern

Department of Physics

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

This work reports an enhanced polarization and mechanisms in optically pumped (OP) hyperpolarized He3 in the presence of He4. The cells contain Rb metal, 60-torr N2, and different pressures of He3 and He4. In the absence of He4, the polarization of He3 increases monotonically from 4.5% to 8% when the pressure of He3 is increased from 300 to 1500 torr. In the presence of 1850-torr He4 gas, the polarization of He3 is enhanced from 7% to 30% for a cell containing 600-torr He3 and 60-torr N2. The wall relaxation factors X for OP cells with and without buffering He4 gas were derived. It was found that the He4 gas confines the He3 atoms to a diffusion-limited region which effectively reduces the wall relaxation factor X. Mechanisms contributed to relaxation are addressed and discussed.

Original language	English
Article number	033422
Journal	Physical Review A - Atomic, Molecular, and Optical Physics
Volume	81
Issue number	3
DOIs	https://doi.org/10.1103/PhysRevA.81.033422
Publication status	Published - 2010 Mar 26

All Science Journal Classification (ASJC) codes

Atomic and Molecular Physics, and Optics

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10.1103/PhysRevA.81.033422

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title = "Enhanced polarization and mechanisms in optically pumped hyperpolarized He3 in the presence of He4",

abstract = "This work reports an enhanced polarization and mechanisms in optically pumped (OP) hyperpolarized He3 in the presence of He4. The cells contain Rb metal, 60-torr N2, and different pressures of He3 and He4. In the absence of He4, the polarization of He3 increases monotonically from 4.5% to 8% when the pressure of He3 is increased from 300 to 1500 torr. In the presence of 1850-torr He4 gas, the polarization of He3 is enhanced from 7% to 30% for a cell containing 600-torr He3 and 60-torr N2. The wall relaxation factors X for OP cells with and without buffering He4 gas were derived. It was found that the He4 gas confines the He3 atoms to a diffusion-limited region which effectively reduces the wall relaxation factor X. Mechanisms contributed to relaxation are addressed and discussed.",

author = "Chen, {Hsin Hsien} and Yang, {Hong Chang} and Horng, {Herng Er} and Lee, {Y. Y.} and Liao, {Shu Hsien} and Yang, {S. Y.} and Chou, {Chung Hsien} and Chang, {Lieh Jeng} and Chen, {M. J.} and Chern, {M. Y.}",

year = "2010",

month = mar,

day = "26",

doi = "10.1103/PhysRevA.81.033422",

language = "English",

volume = "81",

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publisher = "American Physical Society",

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T1 - Enhanced polarization and mechanisms in optically pumped hyperpolarized He3 in the presence of He4

AU - Chen, Hsin Hsien

AU - Yang, Hong Chang

AU - Horng, Herng Er

AU - Lee, Y. Y.

AU - Liao, Shu Hsien

AU - Yang, S. Y.

AU - Chou, Chung Hsien

AU - Chang, Lieh Jeng

AU - Chen, M. J.

AU - Chern, M. Y.

PY - 2010/3/26

Y1 - 2010/3/26

N2 - This work reports an enhanced polarization and mechanisms in optically pumped (OP) hyperpolarized He3 in the presence of He4. The cells contain Rb metal, 60-torr N2, and different pressures of He3 and He4. In the absence of He4, the polarization of He3 increases monotonically from 4.5% to 8% when the pressure of He3 is increased from 300 to 1500 torr. In the presence of 1850-torr He4 gas, the polarization of He3 is enhanced from 7% to 30% for a cell containing 600-torr He3 and 60-torr N2. The wall relaxation factors X for OP cells with and without buffering He4 gas were derived. It was found that the He4 gas confines the He3 atoms to a diffusion-limited region which effectively reduces the wall relaxation factor X. Mechanisms contributed to relaxation are addressed and discussed.

AB - This work reports an enhanced polarization and mechanisms in optically pumped (OP) hyperpolarized He3 in the presence of He4. The cells contain Rb metal, 60-torr N2, and different pressures of He3 and He4. In the absence of He4, the polarization of He3 increases monotonically from 4.5% to 8% when the pressure of He3 is increased from 300 to 1500 torr. In the presence of 1850-torr He4 gas, the polarization of He3 is enhanced from 7% to 30% for a cell containing 600-torr He3 and 60-torr N2. The wall relaxation factors X for OP cells with and without buffering He4 gas were derived. It was found that the He4 gas confines the He3 atoms to a diffusion-limited region which effectively reduces the wall relaxation factor X. Mechanisms contributed to relaxation are addressed and discussed.

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Enhanced polarization and mechanisms in optically pumped hyperpolarized He3 in the presence of He4

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