Enhancement in the Deposition Behavior and Deposit Properties of Electroless Ni-Cu-P

Jen Che Hsu, Kwang Lung Lin

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

This work describes as an attempt to improve the deposit properties of electroless Ni-Cu-P deposits by controlling the deposition condition and the composition of the plating solution. Tensile internal stress induced by hydrogen evolution during electroless Ni-Cu-P deposition was manipulated by controlling deposition conditions such as stirring and zincating. The stirring action releases the hydrogen-induced stress and improves adhesion of the deposit in the condition of once zincate pretreatment. It was also attempted to vary the concentration of reducing agents (NaH2PO 2·H2O), buffering agents (NH4Cl), and complexing agents (Na3C6H5O 7·2H2O) of the plating solution to improve the deposition rate, crystallinity and the composition uniformity of Ni-Cu-P deposits. The results show that a decrease in complexing agents results in steadier deposition of Ni and Cu elements and higher deposition rate. The preferable deposition solution consists of 0.057 mol/L NiSO 4·6H2O, 0.0008 mol/L CuSO 4·5H2O, 0.14 mol/L NaH2PO 2·H2O, 0.07 or 0.09 mol/L Na3C 6H5O7·2H2O, and 0.75 mol/L NH4Cl at pH 8.0, which creates amorphous and uniform Ni-Cu-P deposits.

Original languageEnglish
Pages (from-to)C653-C656
JournalJournal of the Electrochemical Society
Volume150
Issue number9
DOIs
Publication statusPublished - 2003 Jul 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Materials Chemistry
  • Electrochemistry

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