Enhancement of Surface Roughness and Growth Morphology of Nanoporous Anodic Alumina from Commercially Aluminum Alloy 1050 Using Two-Step Electrochemical Polishing

C. K. Chung; C. H. Tsai; Z. W. Wang

doi:10.1149/2.1051810jes

Enhancement of Surface Roughness and Growth Morphology of Nanoporous Anodic Alumina from Commercially Aluminum Alloy 1050 Using Two-Step Electrochemical Polishing

C. K. Chung
, C. H. Tsai
, Z. W. Wang

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	E498-E503
Journal	Journal of the Electrochemical Society
Volume	165
Issue number	10
DOIs	https://doi.org/10.1149/2.1051810jes
Publication status	Published - 2018 Jan 1

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10.1149/2.1051810jes

http://jes.ecsdl.org/lookup/doi/10.1149/2.1051810jes

Cite this

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title = "Enhancement of Surface Roughness and Growth Morphology of Nanoporous Anodic Alumina from Commercially Aluminum Alloy 1050 Using Two-Step Electrochemical Polishing",

author = "Chung, \{C. K.\} and Tsai, \{C. H.\} and Wang, \{Z. W.\}",

year = "2018",

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language = "English",

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journal = "Journal of the Electrochemical Society",

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AU - Chung, C. K.

AU - Tsai, C. H.

AU - Wang, Z. W.

PY - 2018/1/1

Y1 - 2018/1/1

U2 - 10.1149/2.1051810jes

DO - 10.1149/2.1051810jes

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VL - 165

SP - E498-E503

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

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