Evolution of mechanical property of nanocomposite TiSiN films using reactive magnetron cosputtering

Chen-Kuei Chung, J. J. Jhu, S. C. Chang, B. H. Wu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The nanocomposite Ti-Si-N thin flims were prepared by reactive magnetron co-sputtering system. The experimental parameter effect on the evolution of mechanical property of nanocomposite TiSiN Films was investigated. The Ti-Si-N film is a mixed composite consisting of the Ti-Si, Ti-N and Si-N compounds. As Si is added to the polycrystalline Ti-N compound to form Ti-Si-N, the microstructure becomes nanocrystalline grains embedded in a disordered Ti-Si-N or SiNx amorphous matrix i.e. nanocomposite quasi-amorphous microstructure, which is affected by the experimental parameters of nitrogen flow ratio (FN2%, 3, 5, 10 %), Ti power (75, 100, 150 W) and Si power (100, 150 and 200 W) during co-sputtering. The thickness, structural, morphology, chemical composition and mechanical properties of films were characterized by alpha-stepper profiler, Grazing Incidence X-ray Diffraction (GIXRD), scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS) and nanoindenter, respectively. The experimental result shows that deposition rate decreased with increasing FN2%. According to Scherrer's formula, the grain size of films was below 5 nm. The surface morphology each film was very smooth due to fine grains. The hardness and modulus of Ti-Si-N can be enhanced by Ti power and reducing Si power. In this paper, the maximum hardness of 24.86 GPa and Young,s modulus of 183.65 GPa was obtained at Ti 150 W, Si 100 W and 5 FN%.

Original languageEnglish
Title of host publication2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
Pages344-347
Number of pages4
DOIs
Publication statusPublished - 2010 Nov 29
Event5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010 - Xiamen, China
Duration: 2010 Jan 202010 Jan 23

Publication series

Name2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010

Other

Other5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
CountryChina
CityXiamen
Period10-01-2010-01-23

Fingerprint

Nanocomposite films
Mechanical properties
Sputtering
Nanocomposites
Hardness
Microstructure
Deposition rates
Surface morphology
Energy dispersive spectroscopy
Elastic moduli
Nitrogen
X ray diffraction
Scanning electron microscopy
Composite materials
Chemical analysis

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

Cite this

Chung, C-K., Jhu, J. J., Chang, S. C., & Wu, B. H. (2010). Evolution of mechanical property of nanocomposite TiSiN films using reactive magnetron cosputtering. In 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010 (pp. 344-347). [5592231] (2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010). https://doi.org/10.1109/NEMS.2010.5592231
Chung, Chen-Kuei ; Jhu, J. J. ; Chang, S. C. ; Wu, B. H. / Evolution of mechanical property of nanocomposite TiSiN films using reactive magnetron cosputtering. 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010. 2010. pp. 344-347 (2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010).
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title = "Evolution of mechanical property of nanocomposite TiSiN films using reactive magnetron cosputtering",
abstract = "The nanocomposite Ti-Si-N thin flims were prepared by reactive magnetron co-sputtering system. The experimental parameter effect on the evolution of mechanical property of nanocomposite TiSiN Films was investigated. The Ti-Si-N film is a mixed composite consisting of the Ti-Si, Ti-N and Si-N compounds. As Si is added to the polycrystalline Ti-N compound to form Ti-Si-N, the microstructure becomes nanocrystalline grains embedded in a disordered Ti-Si-N or SiNx amorphous matrix i.e. nanocomposite quasi-amorphous microstructure, which is affected by the experimental parameters of nitrogen flow ratio (FN2{\%}, 3, 5, 10 {\%}), Ti power (75, 100, 150 W) and Si power (100, 150 and 200 W) during co-sputtering. The thickness, structural, morphology, chemical composition and mechanical properties of films were characterized by alpha-stepper profiler, Grazing Incidence X-ray Diffraction (GIXRD), scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS) and nanoindenter, respectively. The experimental result shows that deposition rate decreased with increasing FN2{\%}. According to Scherrer's formula, the grain size of films was below 5 nm. The surface morphology each film was very smooth due to fine grains. The hardness and modulus of Ti-Si-N can be enhanced by Ti power and reducing Si power. In this paper, the maximum hardness of 24.86 GPa and Young,s modulus of 183.65 GPa was obtained at Ti 150 W, Si 100 W and 5 FN{\%}.",
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Chung, C-K, Jhu, JJ, Chang, SC & Wu, BH 2010, Evolution of mechanical property of nanocomposite TiSiN films using reactive magnetron cosputtering. in 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010., 5592231, 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010, pp. 344-347, 5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010, Xiamen, China, 10-01-20. https://doi.org/10.1109/NEMS.2010.5592231

Evolution of mechanical property of nanocomposite TiSiN films using reactive magnetron cosputtering. / Chung, Chen-Kuei; Jhu, J. J.; Chang, S. C.; Wu, B. H.

2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010. 2010. p. 344-347 5592231 (2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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N2 - The nanocomposite Ti-Si-N thin flims were prepared by reactive magnetron co-sputtering system. The experimental parameter effect on the evolution of mechanical property of nanocomposite TiSiN Films was investigated. The Ti-Si-N film is a mixed composite consisting of the Ti-Si, Ti-N and Si-N compounds. As Si is added to the polycrystalline Ti-N compound to form Ti-Si-N, the microstructure becomes nanocrystalline grains embedded in a disordered Ti-Si-N or SiNx amorphous matrix i.e. nanocomposite quasi-amorphous microstructure, which is affected by the experimental parameters of nitrogen flow ratio (FN2%, 3, 5, 10 %), Ti power (75, 100, 150 W) and Si power (100, 150 and 200 W) during co-sputtering. The thickness, structural, morphology, chemical composition and mechanical properties of films were characterized by alpha-stepper profiler, Grazing Incidence X-ray Diffraction (GIXRD), scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS) and nanoindenter, respectively. The experimental result shows that deposition rate decreased with increasing FN2%. According to Scherrer's formula, the grain size of films was below 5 nm. The surface morphology each film was very smooth due to fine grains. The hardness and modulus of Ti-Si-N can be enhanced by Ti power and reducing Si power. In this paper, the maximum hardness of 24.86 GPa and Young,s modulus of 183.65 GPa was obtained at Ti 150 W, Si 100 W and 5 FN%.

AB - The nanocomposite Ti-Si-N thin flims were prepared by reactive magnetron co-sputtering system. The experimental parameter effect on the evolution of mechanical property of nanocomposite TiSiN Films was investigated. The Ti-Si-N film is a mixed composite consisting of the Ti-Si, Ti-N and Si-N compounds. As Si is added to the polycrystalline Ti-N compound to form Ti-Si-N, the microstructure becomes nanocrystalline grains embedded in a disordered Ti-Si-N or SiNx amorphous matrix i.e. nanocomposite quasi-amorphous microstructure, which is affected by the experimental parameters of nitrogen flow ratio (FN2%, 3, 5, 10 %), Ti power (75, 100, 150 W) and Si power (100, 150 and 200 W) during co-sputtering. The thickness, structural, morphology, chemical composition and mechanical properties of films were characterized by alpha-stepper profiler, Grazing Incidence X-ray Diffraction (GIXRD), scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS) and nanoindenter, respectively. The experimental result shows that deposition rate decreased with increasing FN2%. According to Scherrer's formula, the grain size of films was below 5 nm. The surface morphology each film was very smooth due to fine grains. The hardness and modulus of Ti-Si-N can be enhanced by Ti power and reducing Si power. In this paper, the maximum hardness of 24.86 GPa and Young,s modulus of 183.65 GPa was obtained at Ti 150 W, Si 100 W and 5 FN%.

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Chung C-K, Jhu JJ, Chang SC, Wu BH. Evolution of mechanical property of nanocomposite TiSiN films using reactive magnetron cosputtering. In 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010. 2010. p. 344-347. 5592231. (2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010). https://doi.org/10.1109/NEMS.2010.5592231