Exploring topological defects in epitaxial BiFeO3 thin films

Rama K. Vasudevan, Yi Chun Chen, Hsiang Hua Tai, Nina Balke, Pingping Wu, Saswata Bhattacharya, L. Q. Chen, Ying Hao Chu, I. Nan Lin, Sergei V. Kalinin, Valanoor Nagarajan

Research output: Contribution to journalArticle

72 Citations (Scopus)

Abstract

Using a combination of piezoresponse force microscopy (PFM) and phase-field modeling, we demonstrate ubiquitous formation of center-type and possible ferroelectric closure domain arrangements during polarization switching near the ferroelastic domain walls in (100) oriented rhombohedral BiFeO3. The formation of these topological defects is determined from the vertical and lateral PFM data and confirmed from the reversible changes in surface topography. These observations provide insight into the mechanisms of tip-induced ferroelastic domain control and suggest that formation of topological defect states under the action of local defect- and tip-induced fields is much more common than previously believed.

Original languageEnglish
Pages (from-to)879-887
Number of pages9
JournalACS Nano
Volume5
Issue number2
DOIs
Publication statusPublished - 2011 Feb 22

Fingerprint

Epitaxial films
Thin films
Defects
defects
Microscopic examination
thin films
microscopy
Domain walls
Surface topography
closures
Ferroelectric materials
domain wall
topography
Polarization
polarization

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Vasudevan, R. K., Chen, Y. C., Tai, H. H., Balke, N., Wu, P., Bhattacharya, S., ... Nagarajan, V. (2011). Exploring topological defects in epitaxial BiFeO3 thin films. ACS Nano, 5(2), 879-887. https://doi.org/10.1021/nn102099z
Vasudevan, Rama K. ; Chen, Yi Chun ; Tai, Hsiang Hua ; Balke, Nina ; Wu, Pingping ; Bhattacharya, Saswata ; Chen, L. Q. ; Chu, Ying Hao ; Lin, I. Nan ; Kalinin, Sergei V. ; Nagarajan, Valanoor. / Exploring topological defects in epitaxial BiFeO3 thin films. In: ACS Nano. 2011 ; Vol. 5, No. 2. pp. 879-887.
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Vasudevan, RK, Chen, YC, Tai, HH, Balke, N, Wu, P, Bhattacharya, S, Chen, LQ, Chu, YH, Lin, IN, Kalinin, SV & Nagarajan, V 2011, 'Exploring topological defects in epitaxial BiFeO3 thin films', ACS Nano, vol. 5, no. 2, pp. 879-887. https://doi.org/10.1021/nn102099z

Exploring topological defects in epitaxial BiFeO3 thin films. / Vasudevan, Rama K.; Chen, Yi Chun; Tai, Hsiang Hua; Balke, Nina; Wu, Pingping; Bhattacharya, Saswata; Chen, L. Q.; Chu, Ying Hao; Lin, I. Nan; Kalinin, Sergei V.; Nagarajan, Valanoor.

In: ACS Nano, Vol. 5, No. 2, 22.02.2011, p. 879-887.

Research output: Contribution to journalArticle

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Vasudevan RK, Chen YC, Tai HH, Balke N, Wu P, Bhattacharya S et al. Exploring topological defects in epitaxial BiFeO3 thin films. ACS Nano. 2011 Feb 22;5(2):879-887. https://doi.org/10.1021/nn102099z