This paper details the fabrication and characteristics of Schottky-gate InGaP/InGaAs pseudomorphic high-electron-mobility transistors (PHEMTs) with GaAs-on-insulator (GOI) structure obtained using liquid-phase chemical-enhanced oxidation (LPCEO). Two oxidation times were investigated, and the PHEMT with GOI structure prepared through 15 min of LPCEO was discovered to have improved subthreshold characteristics, suppressed gate leakage current density, larger breakdown voltage, and less low-frequency noise owing to the isolated oxide film. Therefore, the proposed PHEMT with GOI structure prepared through LPCEO is promising for group III-V compound device applications.
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces, Coatings and Films