Fabrication and characterization of Co(11̄00)/Mo(211) and Co(112̄0)/Mo(100) bilayered films on MgO

Y. D. Yao, Y. Liou, J. C.A. Huang, S. Y. Liao, I. Klik, C. P. Chang, C. K. Lo

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Co/Mo bilayered films have been successfully grown on MgO(100) and MgO(110) substrates by molecular beam epitaxy. According to the reflection high energy electron diffraction and x-ray diffraction measurements the crystal structure of the film depends on the orientation of the buffer and substrate. The growth of biaxial Co(112̄0)/Mo(100) on MgO(100) and of uniaxial Co(11̄00)/Mo(211) on MgO(11̄00) substrates has been confirmed. The anisotropic magnetoresistance (AMR) is strongly influenced by the Co orientation which is altered by growth on Mo/MgO(100) and MgO(110). In Co(112̄0)/Mo(100) on MgO(110) AMR is isotropic for all in-plane fields. However, for Co(11̄00)/Mo(211) on MgO(110) we observed enhancement of AMR along the easy axis at 10 °K.

Original languageEnglish
Pages (from-to)4669-4671
Number of pages3
JournalIEEE Transactions on Magnetics
Volume32
Issue number5 PART 2
DOIs
Publication statusPublished - 1996 Dec 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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