Fabrication and characterization of nanostructured Ta-Si-N films

C. K. Chung, T. S. Chen, C. C. Peng, Bo-Hsiung Wu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

In this paper, the morphology and properties of nanostructured Ta-Si-N thin films fabricated by reactively cosputtering have been studied. The Ta-Si-N film is a mixed composite consisting of the Ta-Si, Ta-N and Si-N compounds. The TaN phase is polycrystalline while SiNx is amorphous. As Si is added to the Ta-N compound to form Ta-Si-N, the microstructure becomes nanocrystalline grains embedded in an amorphous matrix i.e. amorphous-like microstructure, which is also affected by the nitrogen flow ratio i.e. FN2 %= FN2/( FN2+FAr) x 100% during sputtering. Amorphous-like TaSi-N films obtained at small FN2% of 2-10% had smaller roughness, lower resistivity and larger nanohardness compared to polycrystalline films at high FN2% of 20- 30%. The variation of Ta-Si-N microstructure leads to the different electrical and mechanical properties of films. The electric resistivity of Ta-Si-N increases with increasing FN2% while the nanohardness first increases to a maximum of 15.19 GPa from FN2% of 2% to 3%, then decreases with increasing FN2%. The higher hardness in amorphous-like Ta-Si-N exhibits a larger stiffness and resilience than polycrystalline one.

Original languageEnglish
Title of host publicationProceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007
Pages308-311
Number of pages4
DOIs
Publication statusPublished - 2007 Aug 28
Event2007 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007 - Bangkok, Thailand
Duration: 2007 Jan 162007 Jan 19

Publication series

NameProceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007

Other

Other2007 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007
CountryThailand
CityBangkok
Period07-01-1607-01-19

All Science Journal Classification (ASJC) codes

  • Computer Networks and Communications
  • Computer Science Applications
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Fabrication and characterization of nanostructured Ta-Si-N films'. Together they form a unique fingerprint.

Cite this