Fabrication and characterization of non-evaporable porous getter films

Chien Cheng Li, Jow-Lay Huang, Ran Jin Lin, Hsiao Kuo Chang, Jyh-Ming Ting

Research output: Contribution to journalArticlepeer-review

16 Citations (Scopus)


The porous Ti film getters on (100) silicon substrates were prepared using the glancing angle deposition of dc (direct current) magnetron sputtering method. The main deposition parameters that produce the porous Ti films are the low substrate temperature and high glancing angle. The larger the glancing angle is, the higher the porosity of the Ti films is. The porous films, grown at the glancing angle of 70° and room substrate temperature, are composed of nano-columnar crystalline crystals. The size and inter-distance between the columnar crystals are 70 nm and 30 nm, respectively. The porous Ti films have larger capability to absorb the oxygen than that of dense Ti films and Si substrate. The suitable operation condition of porous Ti film getters was also established.

Original languageEnglish
Pages (from-to)1351-1355
Number of pages5
JournalSurface and Coatings Technology
Issue number5-6
Publication statusPublished - 2005 Nov 21

All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

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