Fabrication of antireflective nanostructures for crystalline silicon solar cells by reactive ion etching

Hsin Han Lin, Wen Hua Chen, Chi Jen Wang, Franklin Chau Nan Hong

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

In this study we have fabricated large-area (15 × 15 cm2) subwavelength antireflection structure on poly-Si substrates to reduce their solar reflectivity. A reactive ion etching system was used to fabricate nanostructures on the poly-silicon surface. Reactive gases, composed of chlorine (Cl2), sulfur hexafluoride (SF6) and oxygen (O 2), were activated to fabricate nanoscale pyramids by RF plasma. The poly-Si substrates were etched in various gas compositions for 6-10 min to form nano-pyramids. The sizes of pyramids were about 200-300 nm in heights and about 100 nm in width. Besides the nanoscale features, the high pyramid density on the poly-Si surface is another important factor to reduce the reflectivity. Low-reflectivity surface was fabricated with reflectivity significantly reduced down to < 2% for photons in a wavelength range of 500-900 nm.

Original languageEnglish
Pages (from-to)138-142
Number of pages5
JournalThin Solid Films
Volume529
DOIs
Publication statusPublished - 2013 Feb 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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