Fabrication of cuprous chloride films on copper substrate by chemical bath deposition

Yu Ting Lin, Ji Wei Ci, Wei Chen Tu, Wu Yih Uen, Shan Ming Lan, Tsun Neng Yang, Chin Chang Shen, Chih Hung Wu

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

Polycrystalline CuCl films were fabricated by chemical bath deposition (CBD) on a Cu substrate at a low solution temperature of 90 °C. Continuous CuCl films were prepared using the copper (II) chloride (CuCl2) compound as the precursor for both the Cu2 + and Cl- sources, together with repeated HCl dip treatments. An HCl dip pretreatment of the substrate favored the nucleation of CuCl crystallites. Further, interrupting the film deposition and including an HCl dip treatment of the film growth surface facilitated the deposition of a full-coverage CuCl film. A dual beam (FIB/SEM) system with energy dispersive spectrometry facilities attached revealed a homogeneous CuCl layer with a flat-top surface and an average thickness of about 1 μm. Both the excitonic and biexcitonic emission lines were well-resolved in the 6.4 K photoluminescence spectra. In particular, the free exciton emission line was observable at room temperature, indicating the good quality of the CuCl films prepared by CBD.

Original languageEnglish
Pages (from-to)43-48
Number of pages6
JournalThin Solid Films
Volume591
DOIs
Publication statusPublished - 2015 Sep 30

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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