Fabrication of flexible nano-wired polarizer by contact-transferred and mask embedded lithography and polyurethane acrylate mold

Chin Ching Hsu, Yung Chung Lee

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Citations (Scopus)

Abstract

This work describes using a rigiflex polyurethane acrylate (PUA) mold for the contact-transferred and mask embedded lithography (CMEL), and therefore provides a new approach in nano-fabrication. Based on this fabrication process, metallic linear-grating patterns are successfully embedded into a polymer substrate with the following two cases: (1) line-width of 65 nm, period of 130 nm, area size of 2 × 2.5 cm2; (2) line-width of 60 nm, period of 180 nm, area size of 5 × 5 cm2. These metallic nano-wired polymer substrates can be used as flexible polarizer and their optical performances have been characterized. Advantages and potential application of this nano-fabrication method will be addressed.

Original languageEnglish
Title of host publication2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
Pages893-897
Number of pages5
DOIs
Publication statusPublished - 2010
Event5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010 - Xiamen, China
Duration: 2010 Jan 202010 Jan 23

Publication series

Name2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010

Other

Other5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
CountryChina
CityXiamen
Period10-01-2010-01-23

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

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