TY - GEN
T1 - Fabrication of flexible nano-wired polarizer by contact-transferred and mask embedded lithography and polyurethane acrylate mold
AU - Hsu, Chin Ching
AU - Lee, Yung Chung
PY - 2010
Y1 - 2010
N2 - This work describes using a rigiflex polyurethane acrylate (PUA) mold for the contact-transferred and mask embedded lithography (CMEL), and therefore provides a new approach in nano-fabrication. Based on this fabrication process, metallic linear-grating patterns are successfully embedded into a polymer substrate with the following two cases: (1) line-width of 65 nm, period of 130 nm, area size of 2 × 2.5 cm2; (2) line-width of 60 nm, period of 180 nm, area size of 5 × 5 cm2. These metallic nano-wired polymer substrates can be used as flexible polarizer and their optical performances have been characterized. Advantages and potential application of this nano-fabrication method will be addressed.
AB - This work describes using a rigiflex polyurethane acrylate (PUA) mold for the contact-transferred and mask embedded lithography (CMEL), and therefore provides a new approach in nano-fabrication. Based on this fabrication process, metallic linear-grating patterns are successfully embedded into a polymer substrate with the following two cases: (1) line-width of 65 nm, period of 130 nm, area size of 2 × 2.5 cm2; (2) line-width of 60 nm, period of 180 nm, area size of 5 × 5 cm2. These metallic nano-wired polymer substrates can be used as flexible polarizer and their optical performances have been characterized. Advantages and potential application of this nano-fabrication method will be addressed.
UR - http://www.scopus.com/inward/record.url?scp=78649236896&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=78649236896&partnerID=8YFLogxK
U2 - 10.1109/NEMS.2010.5592124
DO - 10.1109/NEMS.2010.5592124
M3 - Conference contribution
AN - SCOPUS:78649236896
SN - 9781424465439
T3 - 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
SP - 893
EP - 897
BT - 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
T2 - 5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
Y2 - 20 January 2010 through 23 January 2010
ER -