TY - JOUR
T1 - Fabrication of heterostructure-emitter bipolar transistor with a doping-superlattice collector
AU - Sun, Chung Yih
AU - Liu, Wen Chau
AU - Guo, Der Feng
AU - Lour, Wen Shiung
AU - Liu, Rong Chau
N1 - Copyright:
Copyright 2020 Elsevier B.V., All rights reserved.
PY - 1993/1
Y1 - 1993/1
N2 - Grown by molecular beam epitaxy, a sawtooth-doping-superlattice (SDS) structure has been employed in the collector region of a heterostructure-emitter bipolar transistor. For the studied structure, conventional transistor behavior and controllable S-shaped negative-differential-resistance (NDR) performance were simultaneously achieved. First, due to the avalanche multiplications within SDS periods or emitter-base p-n junction depletion region, a bi-directional switching phenomenon was exhibited under the two-terminal operation. In addition, when a base current or bias was applied, transistor properties and a controllable S-shaped NDR family in the large current regime were obtained. The best common-emitter current gain was 25.
AB - Grown by molecular beam epitaxy, a sawtooth-doping-superlattice (SDS) structure has been employed in the collector region of a heterostructure-emitter bipolar transistor. For the studied structure, conventional transistor behavior and controllable S-shaped negative-differential-resistance (NDR) performance were simultaneously achieved. First, due to the avalanche multiplications within SDS periods or emitter-base p-n junction depletion region, a bi-directional switching phenomenon was exhibited under the two-terminal operation. In addition, when a base current or bias was applied, transistor properties and a controllable S-shaped NDR family in the large current regime were obtained. The best common-emitter current gain was 25.
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U2 - 10.1006/spmi.1993.1015
DO - 10.1006/spmi.1993.1015
M3 - Article
AN - SCOPUS:44949269196
VL - 13
SP - 75
EP - 79
JO - Superlattices and Microstructures
JF - Superlattices and Microstructures
SN - 0749-6036
IS - 1
ER -