Thin film of spinel LiMn2O4 was obtained by spin coating the chitosan-containing precursor solution on a platinumized Si substrate, followed by a two-step annealing procedure at 300 and 700 °C, respectively. It was demonstrated that the addition of the appropriate amount of chitosan to the precursor solution enhanced the deposition of LiMn 2O4 films. The thickness of the deposited film from chitosan-containing precursor solution is about 5.2 μm after five-time spin coating under a spinning speed of 2500 rpm. Without the addition of chitosan in precursor solution, the deposited film was as thin as 0.16 μm under the same processing parameters. Furthermore, the electrochemical behavior for the deposited LiMn2O4 film calcined at 700 °C for 1 h was characterized by the charge-discharge test. The result shows that the 1st discharge capacity is 56.31 μAh cm-2 μm-1 at a discharge rate of C/2 and the fading rate of the discharge capacity is only 0.19% cycle-1 after 50 cycles.
All Science Journal Classification (ASJC) codes
- Mechanics of Materials
- Mechanical Engineering
- Metals and Alloys
- Materials Chemistry