TY - GEN
T1 - Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate
AU - Yan, Jhih Nan
AU - Lee, Yung Chun
PY - 2012/6/1
Y1 - 2012/6/1
N2 - This paper describes the fabrication processes of a new type of metal-embedded photo-mask, which will be used in standard photolithography and for fabricating patterned sapphire substrates. This new metal-embedded photo-mask is prepared by metal contact printing lithography and therefore can easily achieve smaller feature size around or below 1 μm. Besides its easiness in fabricating and obtaining smaller line-width, this new metal-embedded photo-mask differs from a conventional Cr/glass photo-mask in that the metallic patterns are embedded and therefore are not in contact with photo-resist during UV exposure. This unique feature can minimize the damage to photo-mask in use and prolong its lifetime. In this work, this metal-embedded photo-mask is experimentally prepared and applied to photolithographic patterning of PR microstructures on sapphire substrates, which are important in LED industries.
AB - This paper describes the fabrication processes of a new type of metal-embedded photo-mask, which will be used in standard photolithography and for fabricating patterned sapphire substrates. This new metal-embedded photo-mask is prepared by metal contact printing lithography and therefore can easily achieve smaller feature size around or below 1 μm. Besides its easiness in fabricating and obtaining smaller line-width, this new metal-embedded photo-mask differs from a conventional Cr/glass photo-mask in that the metallic patterns are embedded and therefore are not in contact with photo-resist during UV exposure. This unique feature can minimize the damage to photo-mask in use and prolong its lifetime. In this work, this metal-embedded photo-mask is experimentally prepared and applied to photolithographic patterning of PR microstructures on sapphire substrates, which are important in LED industries.
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U2 - 10.1109/NEMS.2012.6196717
DO - 10.1109/NEMS.2012.6196717
M3 - Conference contribution
AN - SCOPUS:84861569448
SN - 9781467311243
T3 - 2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012
SP - 36
EP - 39
BT - 2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012
T2 - 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012
Y2 - 5 March 2012 through 8 March 2012
ER -