Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate

Jhih Nan Yan, Yung Chun Lee

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper describes the fabrication processes of a new type of metal-embedded photo-mask, which will be used in standard photolithography and for fabricating patterned sapphire substrates. This new metal-embedded photo-mask is prepared by metal contact printing lithography and therefore can easily achieve smaller feature size around or below 1 μm. Besides its easiness in fabricating and obtaining smaller line-width, this new metal-embedded photo-mask differs from a conventional Cr/glass photo-mask in that the metallic patterns are embedded and therefore are not in contact with photo-resist during UV exposure. This unique feature can minimize the damage to photo-mask in use and prolong its lifetime. In this work, this metal-embedded photo-mask is experimentally prepared and applied to photolithographic patterning of PR microstructures on sapphire substrates, which are important in LED industries.

Original languageEnglish
Title of host publication2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012
Pages36-39
Number of pages4
DOIs
Publication statusPublished - 2012 Jun 1
Event7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012 - Kyoto, Japan
Duration: 2012 Mar 52012 Mar 8

Publication series

Name2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012

Other

Other7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012
CountryJapan
CityKyoto
Period12-03-0512-03-08

    Fingerprint

All Science Journal Classification (ASJC) codes

  • Engineering (miscellaneous)

Cite this

Yan, J. N., & Lee, Y. C. (2012). Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate. In 2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012 (pp. 36-39). [6196717] (2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012). https://doi.org/10.1109/NEMS.2012.6196717