Abstract
Microcontact printing (μCP) was used in conjunction with self-assembled monolayers (SAMs) of hexadecanethiolates to fabricate gold etch masks on GaAs and GaAs/AlGaAs quantum-well substrates; patterns in the mask were transferred into the semiconductor with an anisotropic dry chemical-etch process. The measured luminescence efficiency of the etched features in GaAs/AlGaAs was similar to that of samples patterned using conventional lithography; this observation indicates that no mechanical or chemical damage is incurred in the μCP process.
Original language | English |
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Pages (from-to) | 266-269 |
Number of pages | 4 |
Journal | Nanotechnology |
Volume | 7 |
Issue number | 3 |
DOIs | |
Publication status | Published - 1996 Sept |
All Science Journal Classification (ASJC) codes
- Bioengineering
- General Chemistry
- General Materials Science
- Mechanics of Materials
- Mechanical Engineering
- Electrical and Electronic Engineering