Fabrication of micrometer-scale structures on GaAs and GaAs/AlGaAs quantum well material using microcontact printing

E. Kim, G. M. Whitesides, M. B. Freiler, M. Levy, J. L. Lin, R. M. Osgood

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

Microcontact printing (μCP) was used in conjunction with self-assembled monolayers (SAMs) of hexadecanethiolates to fabricate gold etch masks on GaAs and GaAs/AlGaAs quantum-well substrates; patterns in the mask were transferred into the semiconductor with an anisotropic dry chemical-etch process. The measured luminescence efficiency of the etched features in GaAs/AlGaAs was similar to that of samples patterned using conventional lithography; this observation indicates that no mechanical or chemical damage is incurred in the μCP process.

Original languageEnglish
Pages (from-to)266-269
Number of pages4
JournalNanotechnology
Volume7
Issue number3
DOIs
Publication statusPublished - 1996 Sep 1

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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