Fabrication of p-Type ZnO films grown on arsenic-implanted silicon via thermal diffusion at various substrate temperatures

Yi Jen Huang, Meng Fu Shih, Chia Po Chou, Kuang-Yao Lo, Sheng-Yuan Chu

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

P-type ZnO films fabricated using the diffusion method with arsenic (As)-implanted silicon substrates as the source of dopants are investigated. The diffusion method is not restricted by the substrate and various dopants can be used in the implantation process. We demonstrate that stable p-type conduction appears at a proper substrate temperature (TS). The best crystallinity and electrical properties of the p-type ZnO films were obtained at TS = 400°C. The maximum carrier concentration of the As dopant was 6.7 ~ 1018 cm-3 and the resistivity reached 1.1×10-1 ω-cm. The reproducible As-doped ZnO films can be obtained by this diffusion method.

Original languageEnglish
JournalECS Journal of Solid State Science and Technology
Volume1
Issue number6
DOIs
Publication statusPublished - 2012

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials

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